DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kwak, Jongheon | - |
dc.contributor.author | Mishra, Avnish Kumar | - |
dc.contributor.author | Lee, Jaeyong | - |
dc.contributor.author | Lee, Kyu Seong | - |
dc.contributor.author | Choi, Chungryong | - |
dc.contributor.author | Maiti, Sandip | - |
dc.contributor.author | Kim, Mooseong | - |
dc.contributor.author | Kim, Jin Kon | - |
dc.date.accessioned | 2018-06-15T05:41:36Z | - |
dc.date.available | 2018-06-15T05:41:36Z | - |
dc.date.created | 2017-10-10 | - |
dc.date.issued | 2017-09 | - |
dc.identifier.issn | 0024-9297 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/50743 | - |
dc.description.abstract | For Ultrahigh-density storage media and D-RAM, the feature size of lithography should be much reduced (say less than 10 nm): Though some-research groups reported feature site of 5-6 rim, further reduced feature size is needed. for next generation lithography. We synthesized, via a reversible addition-fragmentation chain-transfer polymerization, polydihydroxystyrene-block-polystyrene (PDHS-b-PS) copolymers showing lamellar and cylindrical microdomains by adjusting the volume fraction of PS block-Ups). We found that the Flory-Huggins interaction parameter (chi) between PDHS and PS was very large, 0.7 at 170 degrees C. Because of-the hugex chi, the lamellar domain spacing (L) of PDHS-b-PS with a total molecular weight of 2.1 kg mol(-1) and f(PS) = 0.5 was only 5.9, nm thus, a sub-3 nm feature size (half-pitch) was successfully obtained, Furthermore, PDHS-b-PS with a molecular weight of 4.2 kg mol(-1) and f(PS) = 0.79 showed hexagonally packed cylinders with 4 nm diameter. We also obtained thin films of PDHS-b-PS with cylindrical microdomains, showing 8.8 nm center-to-center spacing, Furthermore, we fabricated ultrahigh-density ZrO2 nanowire arrays from the cylindrical monolayer thin films via atomic layer deposition, indicating an applicability of PDHS-b-PS for next-generation lithography. | - |
dc.language | English | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.relation.isPartOf | MACROMOLECULES | - |
dc.title | Fabrication of Sub-3 nm Feature Size Based on Block Copolymer Self-Assembly for Next-Generation Nanolithography | - |
dc.type | Article | - |
dc.identifier.doi | 10.1021/acs.macromol.7b00945 | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | MACROMOLECULES, v.50, no.17, pp.6813 - 6818 | - |
dc.identifier.wosid | 000410867400047 | - |
dc.date.tcdate | 2019-02-01 | - |
dc.citation.endPage | 6818 | - |
dc.citation.number | 17 | - |
dc.citation.startPage | 6813 | - |
dc.citation.title | MACROMOLECULES | - |
dc.citation.volume | 50 | - |
dc.contributor.affiliatedAuthor | Mishra, Avnish Kumar | - |
dc.contributor.affiliatedAuthor | Lee, Jaeyong | - |
dc.contributor.affiliatedAuthor | Lee, Kyu Seong | - |
dc.contributor.affiliatedAuthor | Choi, Chungryong | - |
dc.contributor.affiliatedAuthor | Maiti, Sandip | - |
dc.contributor.affiliatedAuthor | Kim, Mooseong | - |
dc.contributor.affiliatedAuthor | Kim, Jin Kon | - |
dc.identifier.scopusid | 2-s2.0-85029316834 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 20 | - |
dc.description.isOpenAccess | N | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | ATOMIC LAYER DEPOSITION | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | DIBLOCK COPOLYMERS | - |
dc.subject.keywordPlus | PHASE-BEHAVIOR | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | METHACRYLATE) | - |
dc.subject.keywordPlus | POLYMERS | - |
dc.subject.keywordPlus | ORDER | - |
dc.subject.keywordPlus | CARAMELIZATION | - |
dc.subject.keywordPlus | NANOSTRUCTURES | - |
dc.relation.journalWebOfScienceCategory | Polymer Science | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Polymer Science | - |
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