Conference
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Effects of High Pressure Hydrogen Anneal Process on Performance and Reliability in HfO2/SiO2 Dielectric with Contact Etch Stop Layer Stressor
- Title
- Effects of High Pressure Hydrogen Anneal Process on Performance and Reliability in HfO2/SiO2 Dielectric with Contact Etch Stop Layer Stressor
- Date Issued
- 2009-06-02
- Publisher
- IEEE
- Article Type
- Conference
- Citation
- IEEE Nanotechnology Materials and Devices Conference (NMDC2009), 2009-06-02
- Files in This Item:
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
Communities & Collection
Related Researcher
- 백록현BAEK, ROCK HYUN
- Dept of Electrical Enginrg