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dc.contributor.authorCHOI, CHUNG RYONG-
dc.contributor.authorPARK JI CHEOL-
dc.contributor.authorKWAK JONGHEON-
dc.contributor.authorKIM, JIN KON-
dc.date.accessioned2018-05-10T23:28:49Z-
dc.date.available2018-05-10T23:28:49Z-
dc.date.created2018-02-27-
dc.date.issued2015-10-06-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/42531-
dc.publisher한국고분자학회-
dc.relation.isPartOf2015 추계학술대회-
dc.relation.isPartOf2015 추계학술대회-
dc.titlePhoto-Induced Order-to-Order phase Transition of Block Copolymer to Fabricate Dual-Pattern Substrate-
dc.typeConference-
dc.type.rimsCONF-
dc.identifier.bibliographicCitation2015 추계학술대회-
dc.citation.conferenceDate2015-10-06-
dc.citation.conferencePlaceKO-
dc.citation.title2015 추계학술대회-
dc.contributor.affiliatedAuthorCHOI, CHUNG RYONG-
dc.contributor.affiliatedAuthorKIM, JIN KON-
dc.description.journalClass2-
dc.description.journalClass2-

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김진곤KIM, JIN KON
Dept. of Chemical Enginrg
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