DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, EH | - |
dc.contributor.author | Park, DH | - |
dc.contributor.author | Park, SY | - |
dc.contributor.author | Lee, KH | - |
dc.contributor.author | Kim, HS | - |
dc.contributor.author | Park, CG | - |
dc.date.accessioned | 2016-04-01T03:30:05Z | - |
dc.date.available | 2016-04-01T03:30:05Z | - |
dc.date.created | 2009-11-20 | - |
dc.date.issued | 2009-10-30 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.other | 2009-OAK-0000020093 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/26580 | - |
dc.description.abstract | Si nanowires were synthesized from Si wafers and from thin Si films deposited on various substrates by microwave irradiation. The power and time were key determinants of the diameter and morphology of the synthesized Si nanowires. The nanowires had an amorphous structure due to the extremely high heating rate. Carbon coating of the Si nanowires was easily achieved by introducing acetylene after synthesizing the nanowires. Carbon-coated Si nanowires are potential candidates for use as the anode material in next generation Li-ion batteries. (C) 2009 Elsevier B.V. All rights reserved. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.relation.isPartOf | THIN SOLID FILMS | - |
dc.subject | Si nanowire | - |
dc.subject | Microwave irradiation | - |
dc.subject | Amorphous structure | - |
dc.subject | SILICON NANOWIRES | - |
dc.subject | LASER-ABLATION | - |
dc.subject | GROWTH | - |
dc.subject | MECHANISM | - |
dc.title | Synthesis of amorphous Si nanowires from solid Si sources using microwave irradiation | - |
dc.type | Article | - |
dc.contributor.college | 화학공학과 | - |
dc.identifier.doi | 10.1016/J.TSF.2009.04.057 | - |
dc.author.google | Kim, EH | - |
dc.author.google | Park, DH | - |
dc.author.google | Park, SY | - |
dc.author.google | Lee, KH | - |
dc.author.google | Kim, HS | - |
dc.author.google | Park, CG | - |
dc.relation.volume | 517 | - |
dc.relation.issue | 24 | - |
dc.relation.startpage | 6629 | - |
dc.relation.lastpage | 6634 | - |
dc.contributor.id | 10053544 | - |
dc.relation.journal | THIN SOLID FILMS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | THIN SOLID FILMS, v.517, no.24, pp.6629 - 6634 | - |
dc.identifier.wosid | 000270410800028 | - |
dc.date.tcdate | 2019-02-01 | - |
dc.citation.endPage | 6634 | - |
dc.citation.number | 24 | - |
dc.citation.startPage | 6629 | - |
dc.citation.title | THIN SOLID FILMS | - |
dc.citation.volume | 517 | - |
dc.contributor.affiliatedAuthor | Lee, KH | - |
dc.contributor.affiliatedAuthor | Park, CG | - |
dc.identifier.scopusid | 2-s2.0-71749088642 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 7 | - |
dc.description.scptc | 7 | * |
dc.date.scptcdate | 2018-05-121 | * |
dc.type.docType | Article | - |
dc.subject.keywordPlus | SILICON NANOWIRES | - |
dc.subject.keywordPlus | LASER-ABLATION | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordAuthor | Si nanowire | - |
dc.subject.keywordAuthor | Microwave irradiation | - |
dc.subject.keywordAuthor | Amorphous structure | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
library@postech.ac.kr Tel: 054-279-2548
Copyrights © by 2017 Pohang University of Science ad Technology All right reserved.