DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, DH | - |
dc.contributor.author | Ryu, CM | - |
dc.contributor.author | Lee, SH | - |
dc.contributor.author | Lee, JK | - |
dc.contributor.author | 이재구 | - |
dc.date.accessioned | 2016-04-01T01:08:07Z | - |
dc.date.available | 2016-04-01T01:08:07Z | - |
dc.date.issued | 2008-01 | - |
dc.identifier.citation | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
dc.identifier.citation | v.47 | - |
dc.identifier.citation | no.8 | - |
dc.identifier.citation | pp.7005-7008 | - |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.other | 2008-OAK-0000008224 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/22454 | - |
dc.description.abstract | Dual-frequency capacitively coupled plasmas (DF-CCPs) have been used to control the ion flux by the high-frequency source and the ion bombardment energy onto the electrode by the low-frequency (LF) source separately. However, an increase in the LF voltage. which extends the maximum ion energy to a higher value, causes the reduction of the bulk plasma length with a subsequent decrease of the plasma density. By using a one-dimensional particle-in-cell/Monte Carlo simulation code, the effect of the magnetic field on a DF-CCP is investigated to find whether the plasma can be sustained during the LF voltage increase. It is found that a low magnetic field can effectively maintain the plasma density and electron temperature constant with respect to the variation of the LF voltage. | - |
dc.description.statementofresponsibility | X | - |
dc.publisher | INST PURE APPLIED PHYSICS | - |
dc.subject | capacitively coupled plasma | - |
dc.subject | dual-frequency | - |
dc.subject | magnetic field | - |
dc.subject | particle-in-cell simulation | - |
dc.subject | RF DISCHARGE | - |
dc.subject | MODEL | - |
dc.subject | SIMULATION | - |
dc.subject | SHEATH | - |
dc.subject | ENERGY | - |
dc.title | Sustainment of Plasma Density by a Low Magnetic Field in a Dual-Frequency Capacitively Coupled Plasma | - |
dc.type | Conference | - |
dc.contributor.college | 전자전기공학과 | - |
dc.identifier.doi | 10.1143/JJAP.47.7005 | - |
dc.author.google | Kim, DH | - |
dc.author.google | Ryu, CM | - |
dc.author.google | Lee, SH | - |
dc.author.google | Lee, JK | - |
dc.relation.volume | 47 | - |
dc.relation.issue | 8 | - |
dc.relation.startpage | 7005 | - |
dc.relation.lastpage | 7008 | - |
dc.contributor.id | 10158178 | - |
dc.publisher.location | JA | - |
dc.relation.journal | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Conference Papers | - |
dc.type.docType | Proceedings Paper | - |
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