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Cited 10 time in webofscience Cited 15 time in scopus
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dc.contributor.authorYoun, RH-
dc.contributor.authorKumar, V-
dc.contributor.authorLee, JH-
dc.contributor.authorSchwindt, R-
dc.contributor.authorChang, WJ-
dc.contributor.authorHong, JY-
dc.contributor.authorJeon, CM-
dc.contributor.authorBae, SB-
dc.contributor.authorPark, MR-
dc.contributor.authorLee, KS-
dc.contributor.authorLee, JL-
dc.contributor.authorLee, JH-
dc.contributor.authorAdesida, I-
dc.date.accessioned2016-03-31T12:52:34Z-
dc.date.available2016-03-31T12:52:34Z-
dc.date.created2009-02-28-
dc.date.issued2003-03-20-
dc.identifier.issn0013-5194-
dc.identifier.other2003-OAK-0000003308-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/18601-
dc.description.abstractMetal organic chemical vapour deposition-grown AlGaN/GaN high electron mobility transistors (HEMTs) with power density up to 4.2 W/mm, one of the highest values ever reported for 0.25 mum gate-length AlGaN/GaN HEMTs, were fabricated on sapphire 2 substrates. The devices exhibited maximum drain current density as high as 1370 mA/mm high transconductance up to 223 mS/mm. short-circuit current gain cutoff frequency of (f(T)) 67 GHz, and maximum frequency of oscillation (f(max)) of 102 GHz.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherIEE-INST ELEC ENG-
dc.relation.isPartOfELECTRONICS LETTERS-
dc.subjectALGAN/GAN HEMTS-
dc.subjectMICROWAVE-
dc.subjectPERFORMANCE-
dc.subjectGAN-
dc.titleHigh power 0.25 mu m gate GaNHEMTs on sapphire with power density 4.2 W/mm at 10 GHz-
dc.typeArticle-
dc.contributor.college신소재공학과-
dc.identifier.doi10.1049/EL:20030339-
dc.author.googleYoun, RH-
dc.author.googleKumar, V-
dc.author.googleLee, JH-
dc.author.googleSchwindt, R-
dc.author.googleChang, WJ-
dc.author.googleHong, JY-
dc.author.googleJeon, CM-
dc.author.googleBae, SB-
dc.author.googlePark, MR-
dc.author.googleLee, KS-
dc.author.googleLee, JL-
dc.author.googleAdesida, I-
dc.relation.volume39-
dc.relation.issue6-
dc.relation.startpage566-
dc.relation.lastpage567-
dc.contributor.id10105416-
dc.relation.journalELECTRONICS LETTERS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationELECTRONICS LETTERS, v.39, no.6, pp.566 - 567-
dc.identifier.wosid000181941000053-
dc.date.tcdate2019-01-01-
dc.citation.endPage567-
dc.citation.number6-
dc.citation.startPage566-
dc.citation.titleELECTRONICS LETTERS-
dc.citation.volume39-
dc.contributor.affiliatedAuthorLee, JL-
dc.identifier.scopusid2-s2.0-0037456885-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc10-
dc.description.scptc14*
dc.date.scptcdate2018-05-121*
dc.type.docTypeArticle-
dc.subject.keywordPlusALGAN/GAN HEMTS-
dc.subject.keywordPlusMICROWAVE-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordPlusGAN-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-

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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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