DC Field | Value | Language |
---|---|---|
dc.contributor.author | Shin, SY | - |
dc.contributor.author | Kim, ND | - |
dc.contributor.author | Kim, JG | - |
dc.contributor.author | Kim, KS | - |
dc.contributor.author | Noh, DY | - |
dc.contributor.author | Kim, KS | - |
dc.contributor.author | Chung, JW | - |
dc.date.accessioned | 2016-03-31T09:23:35Z | - |
dc.date.available | 2016-03-31T09:23:35Z | - |
dc.date.created | 2011-09-22 | - |
dc.date.issued | 2011-08-22 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.other | 2011-OAK-0000024185 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/17120 | - |
dc.description.abstract | We report that the behavior of a low-energy pi plasmon excitation in a single layer graphene (SLG) can be modified by doping external potassium (K) atoms, a feature demanded to realize the graphene plasmonics. Using high-resolution electron-energy-loss spectroscopy, we find that upon K-doping the pi plasmon energy increases by 1.1 eV due to the K-induced electron density up to n=7 x 10(13) cm(-2) in SLG. The four modified dispersions for different K-dopings, however, are found to merge into a single universal curve when plotted in the dimensionless coordinates indicating that the unique plasmonic character of SLG is preserved despite the K-dopings. (C) 2011 American Institute of Physics. [doi:10.1063/1.3630230] | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.relation.isPartOf | APPLIED PHYSICS LETTERS | - |
dc.title | Control of the pi plasmon in a single layer graphene by charge doping | - |
dc.type | Article | - |
dc.contributor.college | 화학과 | - |
dc.identifier.doi | 10.1063/1.3630230 | - |
dc.author.google | Shin, SY | - |
dc.author.google | Kim, ND | - |
dc.author.google | Kim, JG | - |
dc.author.google | Kim, KS | - |
dc.author.google | Noh, DY | - |
dc.author.google | Chung, JW | - |
dc.relation.volume | 99 | - |
dc.relation.issue | 8 | - |
dc.contributor.id | 10051563 | - |
dc.relation.journal | APPLIED PHYSICS LETTERS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.99, no.8 | - |
dc.identifier.wosid | 000294359100038 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.number | 8 | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 99 | - |
dc.contributor.affiliatedAuthor | Kim, KS | - |
dc.contributor.affiliatedAuthor | Chung, JW | - |
dc.identifier.scopusid | 2-s2.0-80052400757 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 54 | - |
dc.description.scptc | 51 | * |
dc.date.scptcdate | 2018-05-121 | * |
dc.type.docType | Article | - |
dc.subject.keywordPlus | EPITAXIAL GRAPHENE | - |
dc.subject.keywordPlus | LARGE-AREA | - |
dc.subject.keywordPlus | SURFACE | - |
dc.subject.keywordPlus | HYDROGENATION | - |
dc.subject.keywordPlus | ELECTRONICS | - |
dc.subject.keywordPlus | FILMS | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
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