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Cited 4 time in webofscience Cited 3 time in scopus
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dc.contributor.authorKwon, T-
dc.contributor.authorPark, W-
dc.contributor.authorChoe, M-
dc.contributor.authorYoon, J-
dc.contributor.authorPark, S-
dc.contributor.authorLee, S-
dc.contributor.authorHwang, H-
dc.contributor.authorLee, T-
dc.date.accessioned2016-03-31T08:41:52Z-
dc.date.available2016-03-31T08:41:52Z-
dc.date.created2013-03-08-
dc.date.issued2012-03-
dc.identifier.issn0021-4922-
dc.identifier.other2012-OAK-0000026967-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/15848-
dc.description.abstractThis study demonstrates a simple and fast method of the operation mode control for ZnO nanowire field effect transistors (FETs) with hydrogen peroxide (H2O2, 10%) solution treatment for 5-10 s. With this H2O2 treatment, the surface of ZnO nanowires was roughened as confirmed by transmission electron microscopy images and the defect level-related emission was increased from photoluminescence (PL) data. Correspondingly, the threshold voltage of H2O2-treated ZnO nanowire FETs shifted to the positive gate bias direction, leading a transition of the operation mode from depletion-mode to enhancement-mode. This H2O2 solution treatment can be a useful method for controlling the operation mode of ZnO nanowire FETs with a wide threshold voltage shift in a few second solution treatment. (C) 2012 The Japan Society of Applied Physics-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherJapan Society of Applied Physics-
dc.relation.isPartOfJAPANESE JOURNAL OF APPLIED PHYSICS-
dc.subjectFABRICATION-
dc.titleCharacterization of ZnO nanowire field effect transistors by fast hydrogen peroxide solution treatment-
dc.typeArticle-
dc.contributor.college신소재공학과-
dc.identifier.doi10.1143/JJAP.51.035001-
dc.author.googleKwon, T-
dc.author.googlePark, W-
dc.author.googleChoe, M-
dc.author.googleYoon, J-
dc.author.googlePark, S-
dc.author.googleLee, S-
dc.author.googleHwang, H-
dc.author.googleLee, T-
dc.relation.volume51-
dc.contributor.id10079928-
dc.relation.journalJAPANESE JOURNAL OF APPLIED PHYSICS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.51, no.3-
dc.identifier.wosid000301348400031-
dc.date.tcdate2019-01-01-
dc.citation.number3-
dc.citation.titleJAPANESE JOURNAL OF APPLIED PHYSICS-
dc.citation.volume51-
dc.contributor.affiliatedAuthorHwang, H-
dc.identifier.scopusid2-s2.0-84863297424-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc1-
dc.description.scptc1*
dc.date.scptcdate2018-05-121*
dc.type.docTypeArticle-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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