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dc.contributor.authorBAEK, ROCK HYUN-
dc.date.accessioned2021-09-03T04:39:50Z-
dc.date.available2021-09-03T04:39:50Z-
dc.date.created2021-05-21-
dc.date.issued2021-01-28-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/107034-
dc.publisher한국반도체학술대회 사무국-
dc.relation.isPartOf제 28회 반도체학술대회-
dc.relation.isPartOf제 28회 반도체학술대회-
dc.titleSi Gate-All-Around Nanosheet FET: the Key Enabler of 3nm Technology Node-
dc.typeConference-
dc.type.rimsCONF-
dc.identifier.bibliographicCitation제 28회 반도체학술대회-
dc.citation.conferenceDate2021-01-25-
dc.citation.conferencePlaceKO-
dc.citation.conferencePlace온라인 개최-
dc.citation.title제 28회 반도체학술대회-
dc.contributor.affiliatedAuthorBAEK, ROCK HYUN-
dc.description.journalClass2-
dc.description.journalClass2-

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백록현BAEK, ROCK HYUN
Dept of Electrical Enginrg
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