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dc.contributor.authorJe, JHko
dc.contributor.authorNoh, DYko
dc.contributor.authorKim, HKko
dc.contributor.authorLiang, KSko
dc.date.available2015-06-25T02:09:34Z-
dc.date.created2009-02-28-
dc.date.issued1997-01-
dc.identifier.citationJOURNAL OF APPLIED PHYSICS, v.81, no.9, pp.6126 - 6133-
dc.identifier.issn0021-8979-
dc.identifier.other2015-OAK-0000009750en_US
dc.identifier.urihttp://oasis.postech.ac.kr/handle/2014.oak/10469-
dc.description.statementofresponsibilityopenen_US
dc.format.extentpdfen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titlePreferred orientation of TiN films studied by a real time synchrotron x-ray scattering-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.author.googleJE, JHen_US
dc.author.googleNOH, DYen_US
dc.author.googleLIANG, KSen_US
dc.author.googleKIM, HKen_US
dc.relation.volume81en_US
dc.relation.issue9en_US
dc.relation.startpage6126en_US
dc.relation.lastpage6133en_US
dc.contributor.id10123980en_US
dc.publisher.locationUSen_US
dc.relation.journalJOURNAL OF APPLIED PHYSICSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.contributor.localauthorJe, JH-
dc.contributor.nonIdAuthorNoh, DY-
dc.contributor.nonIdAuthorKim, HK-
dc.contributor.nonIdAuthorLiang, KS-
dc.identifier.wosidA1997WW72900034-
dc.date.tcdate2019-01-01-
dc.citation.endPage6133-
dc.citation.number9-
dc.citation.startPage6126-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume81-
dc.identifier.scopusid2-S2.0-0031147325-
dc.description.journalClass1-
dc.description.wostc86-

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제정호JE, JUNG HO
Dept of Materials Science & Enginrg
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