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dc.contributor.authorKANG, BONG KOO-
dc.contributor.authorGiyoun Roh-
dc.contributor.authorYoung-Kyu Kown-
dc.contributor.authorHyeok-Jin Kim-
dc.date.accessioned2020-04-17T01:52:34Z-
dc.date.available2020-04-17T01:52:34Z-
dc.date.created2020-04-16-
dc.date.issued2019-09-24-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/103489-
dc.publisherESRF2019-
dc.relation.isPartOfESRF2019-
dc.relation.isPartOfMicroelectronics Reliability-
dc.titleCharacterization of Positive Bias Temperature Instability Concerning Interfacial Layer Thickness of HfSiON/SiO2 nMOSFET-
dc.typeConference-
dc.type.rimsCONF-
dc.identifier.bibliographicCitationESRF2019-
dc.citation.conferenceDate2019-09-23-
dc.citation.conferencePlaceFR-
dc.citation.titleESRF2019-
dc.contributor.affiliatedAuthorKANG, BONG KOO-
dc.contributor.affiliatedAuthorHyeok-Jin Kim-
dc.description.journalClass1-
dc.description.journalClass1-

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강봉구KANG, BONG KOO
Dept of Electrical Enginrg
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