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Browsing by  AuthorRhee, W

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Article
Chemical vapor deposition of RuO2 thin films using the liquid precursor Ru(OD)(3)SCIESCOPUS

ELECTROCHEMICAL AND SOLID STATE LETTERS, vol. 2, no. 12, page. 622 - 623, 1999-12

Article
Microstructure of copper films deposited on TiN substrate by metallorganic chemical vapor depositionSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 149, no. 1, page. C33 - C36, 2002-01

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