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전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

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Showing results 161 to 180 of 205

Article

Particle formation in the remote plasma enhanced chemical vapor deposition of Si films from Si2H6-SiF4-H-2SCIESCOPUS

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, vol. 14, no. 2, page. 478 - 480, 1996-03

Article

Pentacene thin-film transistor with NiOx as a source/drain electrode deposited with sputteringSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 155, no. 11, page. H899 - H902, 2008-01

Article

Phase formation in the tantalum carbonitride film deposited with atomic layer deposition using ammoniaSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 155, no. 10, page. H823 - H828, 2008-01

Article

Photoelectrochemical Hydrogen Generation Using C-dot/ZnO Hierarchical Nanostructure as an Efficient PhotoanodeSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 162, no. 6, page. 366 - 370, 2015-03

Article

Photoelectrochemical Hydrogen Generation Using C-dot/ZnO Hierarchical Nanostructure as an Efficient Photoanode

, 2015-01

Article

Plasma Damage on the OTS Treated SiO2 Substrate in the Source/Drain Electrode Deposition ProcessSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 157, no. 3, page. H349 - H354, 2010-01

Article

Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)(2) and Ti(i-OPr)(4)SCIESCOPUS

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, vol. 20, no. 5, page. 1828 - 1830, 2002-09

Article

Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive GasesSCIESCOPUS

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, vol. 3, no. 6, page. 185 - 191, 2014-04

Article

Plasma enhanced chemical vapor deposition of silicon oxide films with divinyldimethylsilane and tetravinylsilaneSCIESCOPUS

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, vol. 24, no. 2, page. 291 - 295, 2006-03

Article

Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane/Hydrogen GasSCIESCOPUS

ELECTROCHEMICAL AND SOLID STATE LETTERS, vol. 13, no. 12, page. H426 - H427, 2010-01

Article

Precursors for deposition of strontium bismuth tantalate films by direct liquid injection-metallorganic chemical vapor depositionSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 149, no. 1, page. C44 - C49, 2002-01

Article

Preface

, 2002-01

Article

PrefaceSCIESCOPUS

Thin Solid Films, vol. 409, no. 1, page. vii - vii, 2002-04-22

Article

Prevention of oxygen incorporation in poly-Si1-xGex deposition with interfacial amorphous silicon layerSCIESCOPUS

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, vol. 37, no. 1AB, page. L77 - L80, 1998-01-15

Article

Property of hexafluoroacetylacetonateCu(I) (3,3-dimethyl-1-butene) as a liquid precursor for chemical vapor deposition of copper filmsSCIESCOPUS

ELECTROCHEMICAL AND SOLID STATE LETTERS, vol. 3, no. 3, page. 135 - 137, 2000-03

Article

Pyrolysis mechanism of silanes, difluorosilane, and their mixturesSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 143, no. 6, page. 1996 - 2002, 1996-06

Article

Quantitative structure and property analysis of nanoporous low dielectric constant SiCOH thin filmsSCIESCOPUS

JOURNAL OF PHYSICAL CHEMISTRY C, vol. 111, no. 29, page. 10848 - 10854, 2007-07-26

Article

Quasi-ordering in spontaneously associated surface dipoles: an intrinsic interfacial factor for high-k polymer insulated organic field-effect transistorsSCIESCOPUS

JOURNAL OF MATERIALS CHEMISTRY, vol. 22, no. 4, page. 1482 - 1488, 2012-01

Article

Radio frequency sputter deposition of single phase cuprous oxide using Cu2O as a target material and its resistive switching propertiesSCIESCOPUS

THIN SOLID FILMS, vol. 517, no. 2, page. 967 - 971, 2008-11-28

Article

Remote plasma chemical vapour deposition of silicon films at low temperature with H-2 and He plasma gasesSCIESCOPUS

JOURNAL OF PHYSICS D-APPLIED PHYSICS, vol. 32, no. 16, page. 1955 - 1962, 1999-08-21

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