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전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

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Showing results 121 to 140 of 205

Article

Improvement of the SiO2/Si interface characteristics by two-step deposition with intermediate plasma treatment using N-2/He or O-2/He gasSCIESCOPUS

THIN SOLID FILMS, vol. 408, no. 1-2, page. 252 - 259, 2002-04-03

Article

Improvement of the SiO2/Si interface characteristics by two-step deposition with intermediate plasma treatment using O-2/He gasSCIESCOPUS

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, vol. 19, no. 6, page. 2067 - 2072, 2001-11

Article

In situ ultraviolet photoemission spectroscopy measurement of the pentacene-RuO2/Ti contact energy structureSCIESCOPUS

APPLIED PHYSICS LETTERS, vol. 97, no. 7, 2010-08-16

Article

In-Situ Synchrotron X-Ray Scattering Study of Thin Film Growth by Atomic Layer DepositionSCIESCOPUS

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, vol. 11, no. 2, page. 1577 - 1580, 2011-02

Article

Infrared spectroscopic study of atomic layer deposition mechanism for hafnium silicate thin films using HfCl2[N(SiMe3)(2)](2) and H2OSCIESCOPUS

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, vol. 22, no. 6, page. 2392 - 2397, 2004-11

Article

Interface and crystal structures of lanthanum substituted bismuth titanate thin films grown on Si for metal ferroelectric semiconductor structureSCIESCOPUS

INTEGRATED FERROELECTRICS, vol. 72, page. 61 - 70, 2005-01

Article

Interfacial modification of amorphous substrates for microcrystalline silicon growth with in situ hydrogen plasma pretreatmentSCIESCOPUS

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, vol. 202, no. 13, page. 2448 - 2453, 2005-10

Article

Iridium(III) tris-cyclometalated complexes with diphenyloxazolic ligands: influence of ligand structure on electrochemical and photophysical propertiesSCIESCOPUS

TRANSITION METAL CHEMISTRY, vol. 30, no. 7, page. 786 - 791, 2005-10

Article

Key technological elements in dye-sensitized solar cells (DSC)SCIESCOPUSKCI

KOREAN JOURNAL OF CHEMICAL ENGINEERING, vol. 28, no. 7, page. 1481 - 1494, 2011-07

Article

Knitting up" the inter-dipole gaps in dielectric surfaces: An efficient route for high performance organic field-effect transistorsSCIESCOPUS

JOURNAL OF MATERIALS CHEMISTRY, vol. 22, no. 14, page. 6597 - 6602, 2012-02

Article

Layer-by-Layer-Assembled Quantum Dot Multilayer Sensitizers: How the Number of Layers Affects the Photovoltaic Properties of One-Dimensional ZnO Nanowire ElectrodesSCIESCOPUS

CHEMPHYSCHEM, vol. 15, no. 1, page. 69 - 75, 2014-01-13

Article

Low temperature chemical vapor deposition of (Ba, Sr) TiO3 thin films with Ti(mpd)(tmhd)(2) as a Ti sourceSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 148, no. 6, page. C409 - C412, 2001-06

Article

Low temperature CVD of Pb(Zr,Ti)O-3 using Pb(tmhd)(2), Zr(dmae)(4), and Ti(dmae)4SCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 150, no. 8, page. C516 - C522, 2003-08

Article

Low temperature silicon dioxide film deposition by remote plasma enhanced chemical vapor deposition: growth mechanismSCIESCOPUS

SURFACE & COATINGS TECHNOLOGY, vol. 179, no. 2-3, page. 229 - 236, 2004-02-23

Article

LOW-OPERATING VOLTAGE ORGANIC FIELD-EFFECT TRANSISTORS WITH HIGH-K CROSS-LINKED CYANOETHYLATED PULLULAN POLYMER GATE DIELECTRICSSCIESCOPUS

JOURNAL OF MATERIALS CHEMISTRY, vol. 19, no. 29, page. 5250 - 5257, 2009-08

Article

Low-temperature self-curable polyacrylate copolymer gate insulator for hysteresis-free organic field -effect transistorsSCIESCOPUS

ORGANIC ELECTRONICS, vol. 12, no. 12, page. 2040 - 2046, 2011-12

Article

Low-Voltage Bendable Pentacene Thin-Film Transistor with Stainless Steel Substrate and Polystyrene-Coated Hafnium Silicate DielectricSCIESCOPUS

ACS Applied Materials & Interfaces, vol. 4, no. 4, page. 2025 - 2032, 2012-04

Article

Metal-organic chemical vapor deposition of aluminum from dimethylethylamine alaneSCIESCOPUS

THIN SOLID FILMS, vol. 312, no. 1-2, page. 259 - 264, 1998-01-14

Article

Metal-semiconductor contact in organic thin film transistorsSCIESCOPUS

JOURNAL OF MATERIALS CHEMISTRY, vol. 18, no. 45, page. 5437 - 5444, 2008-01

Article

Metallorganic chemical vapor deposition of Pb(Zr, Ti)O-3 films using a single mixture of metallorganic precursorsSCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 148, no. 10, page. C668 - C673, 2001-10

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