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KIM, HYUNGJUN(김형준)
Department
Dept of Materials Science & Engineering(신소재공학과)
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    Publication & Time Cited Count (For the Last 5 years)

    Results 1-7 of 7 (Search time: 0.008 seconds).
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    Subject : atomic layer deposition
    Article
    HFO2/HFOXNY/HFO2 GATE DIELECTRIC FABRICATED BY IN SITU OXIDATION OF PLASMA-ENHANCED ATOMIC LAYER DEPOSITION HFN MIDDLE LAYERSCIESCOPUS

    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 156, no. 8, page. G109 - G113, 2009-01

    Article
    Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer DepositionSCIESCOPUS

    SMALL, vol. 4, no. 12, page. 2247 - 2254, 2008-12

    Article
    Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygenSCIESCOPUS

    THIN SOLID FILMS, vol. 516, no. 21, page. 7345 - 7349, 2008-09-01

    Article
    ZnO thin films prepared by atomic layer deposition and rf sputtering as an active layer for thin film transistorSCIESCOPUS

    THIN SOLID FILMS, vol. 516, no. 7, page. 1523 - 1528, 2008-02-15

    Article
    Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrodeSCIESCOPUS

    MICROELECTRONIC ENGINEERING, vol. 85, no. 1, page. 39 - 44, 2008-01

    Article
    Comparative studies of atomic layer deposition and plasma-enhanced atomic layer deposition Ta2O5 and the effects on electrical properties of in situ nitridationSCIESCOPUS

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, vol. 46, no. 5B, page. 3224 - 3228, 2007-05

    Article
    The application of atomic layer deposition for metallization of 65 nm and beyondSCIESCOPUS

    SURFACE & COATINGS TECHNOLOGY, vol. 200, no. 10, page. 3104 - 3111, 2006-02-24

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