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An Inorganic-Organic Diblock Copolymer Photoresist for Direct Mesoporous SiCN Ceramic Patterns via Photolithography

Title
An Inorganic-Organic Diblock Copolymer Photoresist for Direct Mesoporous SiCN Ceramic Patterns via Photolithography
Authors
Chi, TNPhan, HHPerumal, JKim, DP
POSTECH Authors
Kim, DP
Date Issued
Mar-2011
Publisher
ROYAL SOC CHEMISTRY
URI
http://oasis.postech.ac.kr/handle/2014.oak/9983
DOI
10.1039/C0CC05836J
ISSN
1359-7345
Article Type
Article
Citation
CHEMICAL COMMUNICATIONS, vol. 47, no. 12, page. 3484 - 3486, 2011-03
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김동표KIM, DONG PYO
Dept. of Chemical Enginrg
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