Effect of In Situ H2 Plasma Pretreatment on the Low Temperature Microcrystalline Silicon Film Deposited on Amorphous on Amorphous SiO2 and SiNx:H Surfaces
- Title
- Effect of In Situ H2 Plasma Pretreatment on the Low Temperature Microcrystalline Silicon Film Deposited on Amorphous on Amorphous SiO2 and SiNx:H Surfaces
- Authors
- 이시우
- Publisher
- The Electrochem. Soc
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/91686
- Article Type
- Conference
- Citation
- Proc. of the 14th Int. Conf. on CVD and EUROCVD-11
- Files in This Item:
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.