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Study of LOR5B resist for the Fabrication of Hard X-ray Zone Plates by E-beam Lithography and ICP

Title
Study of LOR5B resist for the Fabrication of Hard X-ray Zone Plates by E-beam Lithography and ICP
Authors
제정호
POSTECH Authors
제정호
Publisher
AIP
URI
https://oasis.postech.ac.kr/handle/2014.oak/91316
Article Type
Conference
Citation
AIP Conference Proceedings: Synchrotron Radiation Instrumentation: Ninth International Conference, page. 1516 - 1519
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제정호JE, JUNG HO
Dept of Materials Science & Enginrg
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