Conference
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 이시우 | - |
| dc.date.accessioned | 2018-06-24T13:13:26Z | - |
| dc.date.available | 2018-06-24T13:13:26Z | - |
| dc.date.created | 2009-03-27 | - |
| dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/91280 | - |
| dc.relation.isPartOf | Korea-Japan Symposium on Materials (O-1) | - |
| dc.relation.isPartOf | Korea-Japan Symposium on Materials (O-1) | - |
| dc.title | Atomic layer chemical vapor deposition (ALCVD) of hafnium silicate films for nano CMOS gate dielectric applications | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.identifier.bibliographicCitation | Korea-Japan Symposium on Materials (O-1) | - |
| dc.citation.conferenceDate | 2003-05-22 | - |
| dc.citation.title | Korea-Japan Symposium on Materials (O-1) | - |
| dc.contributor.affiliatedAuthor | 이시우 | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalClass | 1 | - |
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