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Overview of atomic layer chemical vapor deposition (ALCVD) -Hafnium silicate high-k gate dielectric for next generation nano devices
- Title
- Overview of atomic layer chemical vapor deposition (ALCVD) -Hafnium silicate high-k gate dielectric for next generation nano devices
- Authors
- 이시우
- Publisher
- The Society of Chemical Engineers, Japan
- Article Type
- Conference
- Citation
- 6th Japan - Korea Symposium on Materials & Interfaces
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