Remote plasma enhanced metal organic chemical vapor deposition of TiN for diffusion barrier
- Title
- Remote plasma enhanced metal organic chemical vapor deposition of TiN for diffusion barrier
- Authors
- 이시우
- Publisher
- Key Tech.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/90642
- Article Type
- Conference
- Citation
- Proc. of 2nd Korean-Japan Symposium on Adv. Mater
- Files in This Item:
- There are no files associated with this item.
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