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Direct liquid injection-metal organic chemical vapor deposition (DLI-MOCVD) of copper oxide thin films using anhydrate and hydrated bis-(hexafluropentanedionato) copper (II) precursor
- Title
- Direct liquid injection-metal organic chemical vapor deposition (DLI-MOCVD) of copper oxide thin films using anhydrate and hydrated bis-(hexafluropentanedionato) copper (II) precursor
- Authors
- Annamalai, Alagappan
- Date Issued
- 2008
- Publisher
- 포항공과대학교
- URI
- http://postech.dcollection.net/jsp/common/DcLoOrgPer.jsp?sItemId=000001909463
http://oasis.postech.ac.kr/handle/2014.oak/8706
- Article Type
- Thesis
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