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FLOURINATED SILICON NITRIDE FILM DEPOSITED AT LOW TEMPERATURES FROM SiH4-SiF4-NH3

Title
FLOURINATED SILICON NITRIDE FILM DEPOSITED AT LOW TEMPERATURES FROM SiH4-SiF4-NH3
Authors
이시우
Date Issued
1999-01-01
Publisher
MRS
URI
https://oasis.postech.ac.kr/handle/2014.oak/86496
Article Type
Conference
Citation
Mat. Res. Soc. Symp. Proc., page. 471, 1999-01-01
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