Remote plasma enhanced chemical vapor deposition of TiN from tetrakis-dimethyl-amido-titanim
- Title
- Remote plasma enhanced chemical vapor deposition of TiN from tetrakis-dimethyl-amido-titanim
- Authors
- 이시우
- Date Issued
- 1999-01-01
- Publisher
- Asian Pacific Confederation of Chemical Engineers
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/86493
- Article Type
- Conference
- Citation
- Proceedings of 8th Asian Pacific Confederation of Chemical Engineers, page. 1469, 1999-01-01
- Files in This Item:
- There are no files associated with this item.
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