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Electrical and physical characteristics of MOCVD zirconium and hafnium silicate thin films using new combinations of precursors

Title
Electrical and physical characteristics of MOCVD zirconium and hafnium silicate thin films using new combinations of precursors
Authors
용기중
Publisher
한양대학교
URI
https://oasis.postech.ac.kr/handle/2014.oak/85504
Article Type
Conference
Citation
화공학회 2003년 가을학술대회, page. 197
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용기중YONG, KIJUNG
Dept. of Chemical Enginrg
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