Electrical and physical characteristics of MOCVD zirconium and hafnium silicate thin films using new combinations of precursors
- Title
- Electrical and physical characteristics of MOCVD zirconium and hafnium silicate thin films using new combinations of precursors
- Authors
- 용기중
- Publisher
- 한양대학교
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/85504
- Article Type
- Conference
- Citation
- 화공학회 2003년 가을학술대회, page. 197
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