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Fluorinated silicon nitride film deposited at low temperatures from SiH4-SiF4-NH3

Title
Fluorinated silicon nitride film deposited at low temperatures from SiH4-SiF4-NH3
Authors
이시우
Date Issued
1998-01-01
Publisher
Material Research Society
URI
https://oasis.postech.ac.kr/handle/2014.oak/78881
Article Type
Conference
Citation
Materials Research Society, 1998-01-01
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