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Chemical vapor deposition of copper film from (hfac)Cu(VCH) and (hfac)Cu(MP)
- Title
- Chemical vapor deposition of copper film from (hfac)Cu(VCH) and (hfac)Cu(MP)
- Authors
- 이시우
- Date Issued
- 1999-02-09
- Publisher
- 현대전자산업주식회사
- Article Type
- Conference
- Citation
- 한국반도체학술대회, page. 257, 1999-02-09
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