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dc.contributor.author김재현en_US
dc.date.accessioned2015-02-25T12:36:02Z-
dc.date.available2015-02-25T12:36:02Z-
dc.date.issued2006en_US
dc.identifier.otherOAK-2015-05414en_US
dc.identifier.urihttp://postech.dcollection.net/jsp/common/DcLoOrgPer.jsp?sItemId=000001907577en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/7795-
dc.descriptionDoctoren_US
dc.languagekoren_US
dc.publisher포항공과대학교en_US
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleMetal-alkylamide와 metal-alkoxide 화합물을 사용한 Hf-silicate 박막의 원자층화학증착 및 유기금속화학증착en_US
dc.title.alternative(Atomic Layer) Chemical Vapor Deposition of Hf-silicate Gate Dielectrics Using a Precursor Combination:Metal Complex of Alkylamido and Alkoxide Groupsen_US
dc.typeThesisen_US
dc.contributor.college일반대학원 화학공학과en_US
dc.date.degree2006-02en_US

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