Deposition and characterization of ultra thin hafnium and zirconium silicate films on Si(100) using metal complexes of alkoxide and amido groups
- Title
- Deposition and characterization of ultra thin hafnium and zirconium silicate films on Si(100) using metal complexes of alkoxide and amido groups
- Authors
- 용기중
- Date Issued
- 2004-11-01
- Publisher
- AIChE
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/76838
- Article Type
- Conference
- Citation
- AIChE Annual Meeting, 2004-11-01
- Files in This Item:
- There are no files associated with this item.
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