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Deposition and characterization of ultra thin hafnium and zirconium silicate films on Si(100) using metal complexes of alkoxide and amido groups

Title
Deposition and characterization of ultra thin hafnium and zirconium silicate films on Si(100) using metal complexes of alkoxide and amido groups
Authors
용기중
Date Issued
2004-11-01
Publisher
AIChE
URI
https://oasis.postech.ac.kr/handle/2014.oak/76838
Article Type
Conference
Citation
AIChE Annual Meeting, 2004-11-01
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