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Atomic layer chemical vapor deposition and characterization of Hf-silicate, Hf-silicate/Al2O3 and Hf-silicate/SiO2 gate dielectrics

Title
Atomic layer chemical vapor deposition and characterization of Hf-silicate, Hf-silicate/Al2O3 and Hf-silicate/SiO2 gate dielectrics
Authors
용기중
POSTECH Authors
용기중
Date Issued
31-Oct-2005
Publisher
AVS
URI
http://oasis.postech.ac.kr/handle/2014.oak/72968
Article Type
Conference
Citation
American Vacuum Society 52nd Symposium, 2005-10-31
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용기중YONG, KIJUNG
Dept. of Chemical Enginrg
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