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ALCVD를 이용한 Hf-silicate, Ti-silicate 게이트 산화막 성장 및 특성 연구

Title
ALCVD를 이용한 Hf-silicate, Ti-silicate 게이트 산화막 성장 및 특성 연구
Authors
용기중
POSTECH Authors
용기중
Date Issued
27-Oct-2006
Publisher
화학공학회
URI
http://oasis.postech.ac.kr/handle/2014.oak/72670
Article Type
Conference
Citation
한국화학공학회 2006년 가을 학술대회, 2006-10-27
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용기중YONG, KIJUNG
Dept. of Chemical Enginrg
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