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Atomic Layer Chemical Vapor Deposition and Characterization of Ti-silicate Gate Dielectrics Using Tetrakis-diethylamido Titanium (TDEAT) and Tetrabutoxyorthosilane (TBOS)

Title
Atomic Layer Chemical Vapor Deposition and Characterization of Ti-silicate Gate Dielectrics Using Tetrakis-diethylamido Titanium (TDEAT) and Tetrabutoxyorthosilane (TBOS)
Authors
용기중
POSTECH Authors
용기중
Date Issued
1-Apr-2007
URI
http://oasis.postech.ac.kr/handle/2014.oak/72595
Article Type
Conference
Citation
화학공학회 2007 봄 정기학술대회, 2007-04-01
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용기중YONG, KIJUNG
Dept. of Chemical Enginrg
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