Thesis
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 이재유 | en_US |
| dc.date.accessioned | 2014-12-01T11:46:27Z | - |
| dc.date.available | 2014-12-01T11:46:27Z | - |
| dc.date.issued | 2010 | en_US |
| dc.identifier.other | OAK-2014-00152 | en_US |
| dc.identifier.uri | http://postech.dcollection.net/jsp/common/DcLoOrgPer.jsp?sItemId=000000563469 | en_US |
| dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/654 | - |
| dc.description | Master | en_US |
| dc.description.abstract | A tolerance study of the undulator parameter error for the 0.1 nm X-ray Free Electron Laser at Pohang AcceleratorLaboratory (PAL XFEL) has been performed and the results are presented in this paper. Effects of random and periodic errors on the FEL performance have been investigated, especially on the saturation power and saturation length. Periodic errors include sinusoidal and sawtooth forms. The study assumes non-steering errorbecause it can be cured by beam-based alignment technique. As a result, we found that an rms 0.05% random error of undulator K increases the saturation length approximately by 2% and decreasesthe satuation power by 6%. | en_US |
| dc.language | eng | en_US |
| dc.publisher | 포항공과대학교 | en_US |
| dc.rights | BY_NC_ND | en_US |
| dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/2.0/kr | en_US |
| dc.title | PAL XFEL의 언듈레이터 허용오차에 관한 연구 | en_US |
| dc.title.alternative | Undulator Tolerance Study for 0.1 nm PAL XFEL | en_US |
| dc.type | Thesis | en_US |
| dc.contributor.college | 일반대학원 물리학과 | en_US |
| dc.date.degree | 2010- 2 | en_US |
| dc.contributor.department | 포항공과대학교 | en_US |
| dc.type.docType | Thesis | - |
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