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A Novel Technique for the Non-Destructive Measurement of EUV Mask Sidewall Angle by using Field-Emission CD-SEM and its Analysis
- Title
- A Novel Technique for the Non-Destructive Measurement of EUV Mask Sidewall Angle by using Field-Emission CD-SEM and its Analysis
- Authors
- 김오현
- Date Issued
- 2012-08-16
- Publisher
- Nano Technology Research Association
- Article Type
- Conference
- Citation
- Nano Korea 2012 Symposium, 2012-08-16
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Related Researcher
- 김오현KIM, OHYUN
- Dept of Electrical Enginrg