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A Novel Technique for the Non-Destructive Measurement of EUV Mask Sidewall Angle by using Field-Emission CD-SEM and its Analysis

Title
A Novel Technique for the Non-Destructive Measurement of EUV Mask Sidewall Angle by using Field-Emission CD-SEM and its Analysis
Authors
김오현
POSTECH Authors
김오현
Date Issued
16-Aug-2012
Publisher
Nano Technology Research Association
URI
http://oasis.postech.ac.kr/handle/2014.oak/63937
Article Type
Conference
Citation
Nano Korea 2012 Symposium, 2012-08-16
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김오현KIM, OHYUN
Dept of Electrical Enginrg
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