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dc.contributor.author정윤하-
dc.date.accessioned2018-06-18T04:58:07Z-
dc.date.available2018-06-18T04:58:07Z-
dc.date.created2012-04-27-
dc.date.issued2010-10-13-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/61515-
dc.publisherIEEE-
dc.relation.isPartOfNanotechnology Materials and Devices Conference-
dc.relation.isPartOf2010 IEEE NANOTECHNOLOGY MATERIALS AND DEVICES CONFERENCE-
dc.titleReliability Properties in sub-50nm High Performance High-k/Metal Gate Stacks SiGe pMOSFETs-
dc.typeConference-
dc.type.rimsCONF-
dc.identifier.bibliographicCitationNanotechnology Materials and Devices Conference-
dc.citation.conferencePlaceUS-
dc.citation.titleNanotechnology Materials and Devices Conference-
dc.contributor.affiliatedAuthor정윤하-
dc.description.journalClass1-
dc.description.journalClass1-

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정윤하JEONG, YOON HA
Dept of Electrical Enginrg
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