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Reliability Properties in sub-50nm High Performance High-k/Metal Gate Stacks SiGe pMOSFETs

Title
Reliability Properties in sub-50nm High Performance High-k/Metal Gate Stacks SiGe pMOSFETs
Authors
정윤하
POSTECH Authors
정윤하
Date Issued
13-Oct-2010
Publisher
IEEE
URI
http://oasis.postech.ac.kr/handle/2014.oak/61515
Article Type
Conference
Citation
Nanotechnology Materials and Devices Conference, 2010-10-13
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정윤하JEONG, YOON HA
Dept of Electrical Enginrg
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