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EUVL Flare Modeling with an Improved Accuracy for Feasibility Study of Sub-22nm HP Node
- Title
- EUVL Flare Modeling with an Improved Accuracy for Feasibility Study of Sub-22nm HP Node
- POSTECH Authors
- 김오현
- Date Issued
- 16-Jun-2011
- Publisher
- EUVL
- Article Type
- Conference
- Citation
- International Workshop on EUV Lithography, 2011-06-16
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Related Researcher
- 김오현KIM, OHYUN
- Dept of Electrical Enginrg