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dc.contributor.author김효욱en_US
dc.date.accessioned2015-02-24T15:11:06Z-
dc.date.available2015-02-24T15:11:06Z-
dc.date.issued2001en_US
dc.identifier.otherOAK-2015-03649en_US
dc.identifier.urihttp://postech.dcollection.net/jsp/common/DcLoOrgPer.jsp?sItemId=000001905801en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/6029-
dc.descriptionDoctoren_US
dc.languagekoren_US
dc.publisher포항공과대학교en_US
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.title저온 게이트 산화막의 플라즈마 화학증착과 계면 특성 개선에 대한 연구en_US
dc.title.alternativeA Study on the plasma enhanced chemical vapor deposition for low temperature gate silicon dioxide and improvement of interface propertyen_US
dc.typeThesisen_US
dc.contributor.college일반대학원 화학공학과en_US
dc.date.degree2001-02en_US
dc.type.docTypeThesis-

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