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Thesis
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dc.contributor.author이문석en_US
dc.date.accessioned2015-02-24T14:39:14Z-
dc.date.available2015-02-24T14:39:14Z-
dc.date.issued1999en_US
dc.identifier.otherOAK-2015-02494en_US
dc.identifier.urihttp://postech.dcollection.net/jsp/common/DcLoOrgPer.jsp?sItemId=000001899647en_US
dc.identifier.urihttp://oasis.postech.ac.kr/handle/2014.oak/4874-
dc.descriptionDoctoren_US
dc.languagekoren_US
dc.publisher포항공과대학교en_US
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.title0.1μm 영역의 X-선 리소그래피에서의 패턴의 특성분석에 관한연구en_US
dc.title.alternativeA Study on the Characterization of Pattern Quality in0.1μm Regime X-ray Lithographyen_US
dc.typeThesisen_US
dc.contributor.college일반대학원 전자전기공학과en_US
dc.date.degree1999-02en_US

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