Conference
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 조기희 | - |
| dc.contributor.author | 이시우 | - |
| dc.date.accessioned | 2018-05-23T15:40:54Z | - |
| dc.date.available | 2018-05-23T15:40:54Z | - |
| dc.date.created | 2010-07-05 | - |
| dc.date.issued | 2010-06-22 | - |
| dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/46940 | - |
| dc.publisher | ALD 2010 | - |
| dc.relation.isPartOf | 10th International Conference on Atomic Layer Deposition | - |
| dc.title | Plasma enhanced atomic layer deposition of TaCxNy thin film with TBTDET and methane/hydrogen gas for NMOSFET gate electrode | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.identifier.bibliographicCitation | 10th International Conference on Atomic Layer Deposition | - |
| dc.citation.conferenceDate | 2010-06-20 | - |
| dc.citation.conferencePlace | KO | - |
| dc.citation.title | 10th International Conference on Atomic Layer Deposition | - |
| dc.contributor.affiliatedAuthor | 조기희 | - |
| dc.contributor.affiliatedAuthor | 이시우 | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalClass | 1 | - |
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