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Impact of Dipole-induced Dielectric Relaxation on High-frequency Performance in La-incorporated HfSiON/Metal Gate

Title
Impact of Dipole-induced Dielectric Relaxation on High-frequency Performance in La-incorporated HfSiON/Metal Gate
Authors
이정수
Date Issued
2009-12-08
Publisher
IEEE
URI
https://oasis.postech.ac.kr/handle/2014.oak/46659
Article Type
Conference
Citation
International Eledtron Devices Meeting 2009, page. 127 - 130, 2009-12-08
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이정수LEE, JEONG SOO
Dept of Electrical Enginrg
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