A novel nanochannel fabrication for nanofluidic applications using synchrotron radiation via micro patterned X-ray mask
SCIE
SCOPUS
- Title
- A novel nanochannel fabrication for nanofluidic applications using synchrotron radiation via micro patterned X-ray mask
- Authors
- Hyungkook Jeon; Jong Hyun Kim; Lim, G
- Date Issued
- 2016-05
- Publisher
- RSC
- Abstract
- Micro- and nanofluidic devices are being used increasingly in biological, chemical, and medical applications, and many fabrication methods have been proposed. While micro-sized structures are simply fabricated using standard ultraviolet (UV) lithography processes, there are still limitations in the fabrication of nano-sized structures. This study presents a novel X-ray mask fabrication method for fabricating extremely long nano-sized channels using synchrotron radiation (width and height: similar to 200 nm, length: similar to 2 cm). The X-ray mask used for manufacturing the nano-sized channels can simply be fabricated by depositing metal on microstructures tilted at a specific angle. The proposed method overcomes the limitations of traditional nanofabrication methods, which are complex, expensive, and time-consuming. Using the fabricated nanochannels, the generation of ion concentration polarization, a novel transport phenomenon in nanofluidics, was investigated. Our novel fabrication method should be a useful tool for various nanofluidic applications due to its various advantages, including simple fabrication process, controllability, and duplicability.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/36517
- DOI
- 10.1039/C6RA08657H
- ISSN
- 2046-2069
- Article Type
- Article
- Citation
- RSC Advances, vol. 6, no. 52, page. 46068 - 46072, 2016-05
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