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Effects of H-2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures SCIE SCOPUS

Title
Effects of H-2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
Authors
Choi, KKKee, JPark, CGKim, DK
Date Issued
2015-04
Publisher
IOP PUBLISHING LTD
Abstract
We evaluated the effects of H-2 plasma and thermal treatment on current-voltage (I-V) and capacitance-voltage ( C-V) characteristics using Al/Al2O3/Si. H-2 plasma treatment reduced the concentration of C and enhanced the diffusion of Si and O atoms and the mean breakdown field strength. The breakdown field increased significantly after rapid thermal annealing (RTA) due to crystallization and the formation of an interface layer between Si and Al2O3, which was confirmed by TEM, secondary ion mass spectroscopy (SIMS), and three-dimensional (3D) atom probe tomography. H-2 plasma treatment produced a negative fixed charge due to the outgassing of C and H-2, and RTA produced a positive fixed charge. (C) 2015 The Japan Society of Applied Physics
URI
https://oasis.postech.ac.kr/handle/2014.oak/35355
DOI
10.7567/APEX.8.045801
ISSN
1882-0778
Article Type
Article
Citation
APPLIED PHYSICS EXPRESS, vol. 8, no. 4, 2015-04
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박찬경PARK, CHAN GYUNG
Dept of Materials Science & Enginrg
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