DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, JH | - |
dc.contributor.author | Chae, BK | - |
dc.contributor.author | Kim, JJ | - |
dc.contributor.author | Lee, SY | - |
dc.contributor.author | Park, CG | - |
dc.date.accessioned | 2016-04-01T07:58:48Z | - |
dc.date.available | 2016-04-01T07:58:48Z | - |
dc.date.created | 2015-06-18 | - |
dc.date.issued | 2015-01 | - |
dc.identifier.issn | 1738-8090 | - |
dc.identifier.other | 2015-OAK-0000032689 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/27084 | - |
dc.description.abstract | Dopant control becomes more difficult and critical as silicon devices become smaller. We observed the dopant distribution in a thermally annealed polysilicon gate using Transmission Electron Microscopy (TEM) and Atom probe tomography (APT). Phosphorus was doped at the silicon-nitride-diffusion-barrier-layer-covered polycrystalline silicon gate. Carbon also incorporated at the gate for the enhancement of operation uniformity. The impurity distribution was observed using atom probe tomography. The carbon atoms had segregated at grain boundaries and suppressed silicon grain growth. Phosphorus atoms, on the other hand, tended to pile-up at the interface. A 1-nm-thick diffusion bather effectively blocked P atom out-diffusion. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | KOREAN INST METALS MATERIALS | - |
dc.relation.isPartOf | ELECTRONIC MATERIALS LETTERS | - |
dc.title | 3-D Observation of Dopant Distribution at NAND Flash Memory Floating Gate Using Atom Probe Tomography | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | - |
dc.identifier.doi | 10.1007/S13391-014-4194-3 | - |
dc.author.google | Lee, JH | - |
dc.author.google | Chae, BK | - |
dc.author.google | Kim, JJ | - |
dc.author.google | Lee, SY | - |
dc.author.google | Park, CG | - |
dc.relation.volume | 11 | - |
dc.relation.issue | 1 | - |
dc.relation.startpage | 60 | - |
dc.relation.lastpage | 64 | - |
dc.contributor.id | 10069857 | - |
dc.relation.journal | ELECTRONIC MATERIALS LETTERS | - |
dc.relation.sci | SCIE | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | ELECTRONIC MATERIALS LETTERS, v.11, no.1, pp.60 - 64 | - |
dc.identifier.wosid | 000350524100009 | - |
dc.date.tcdate | 2019-02-01 | - |
dc.citation.endPage | 64 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 60 | - |
dc.citation.title | ELECTRONIC MATERIALS LETTERS | - |
dc.citation.volume | 11 | - |
dc.contributor.affiliatedAuthor | Park, CG | - |
dc.identifier.scopusid | 2-s2.0-84922363874 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 2 | - |
dc.description.scptc | 2 | * |
dc.date.scptcdate | 2018-05-121 | * |
dc.type.docType | Article | - |
dc.subject.keywordPlus | INTERFACE | - |
dc.subject.keywordPlus | SILICON | - |
dc.subject.keywordPlus | DIFFUSION | - |
dc.subject.keywordPlus | CARBON | - |
dc.subject.keywordAuthor | atom probe | - |
dc.subject.keywordAuthor | floating gate | - |
dc.subject.keywordAuthor | diffusion barrier | - |
dc.subject.keywordAuthor | dopant distribution | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Materials Science | - |
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