Chemical vapor deposition of nickel oxide films from Ni(C5H5)(2)/O-2
SCIE
SCOPUS
- Title
- Chemical vapor deposition of nickel oxide films from Ni(C5H5)(2)/O-2
- Authors
- Kang, JK; Rhee, SW
- Date Issued
- 2001-07-02
- Publisher
- ELSEVIER SCIENCE SA
- Abstract
- Nickel oxide films were deposited with Ni(C5H5)(2)(bis-cyclopentadienyl nickel)/O-2 at various temperatures and O-2 flow rates. Gas phase reaction of Ni(C5H5)(2)/O-2 was observed above the temperature of 300 degreesC and a peak from CO2, the product of the Ni(C5H5)(2) oxidation, was observed. Pure oxide films were not obtained but a mixed phase of nickel, NiO and Ni2O3 was observed and the amount of each phase in the film depended on the deposition condition. Films deposited at a high deposition temperature region (> 275 degreesC) had a high nickel content, and NiO(111) preferred crystal orientation. Films deposited at a low deposition temperature region (< 275 degreesC) had low nickel content and NiO(200) preferred orientation. (C) 2001 Elsevier Science B.V. All rights reserved.
- Keywords
- nickel oxide film; Ni(C5H5)(2); metal organic chemical vapor deposition; diagnostics of gas phase reaction; ELECTROCHROMIC PROPERTIES; NIO FILMS
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/20976
- DOI
- 10.1016/S0040-6090(01)00962-2
- ISSN
- 0040-6090
- Article Type
- Article
- Citation
- THIN SOLID FILMS, vol. 391, no. 1, page. 57 - 61, 2001-07-02
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