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Effect of process temperature on the structural and electrical properties of atomic layer deposited ZrO2 films using tris(dimethylamino) cyclopentadienyl zirconium precursor

Title
Effect of process temperature on the structural and electrical properties of atomic layer deposited ZrO2 films using tris(dimethylamino) cyclopentadienyl zirconium precursor
Authors
Dong Chan WonRhee, SW
Date Issued
May-2014
Publisher
AVS
URI
http://oasis.postech.ac.kr/handle/2014.oak/11296
DOI
10.1116/1.4825109
ISSN
1071-1023
Article Type
Article
Citation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, vol. 32, no. 3, 2014-05
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