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Cited 30 time in webofscience Cited 28 time in scopus
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dc.contributor.authorKim, HC-
dc.contributor.authorLee, JK-
dc.date.accessioned2015-06-25T02:34:37Z-
dc.date.available2015-06-25T02:34:37Z-
dc.date.created2009-02-28-
dc.date.issued2005-07-
dc.identifier.issn0734-2101-
dc.identifier.other2015-OAK-0000005293en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/11228-
dc.description.abstractA concept of effective frequency is introduced to study dual-frequency (DF) capacitively coupled plasmas (CCP) which can be analyzed in a fashion similar to single-frequency (SF) CCP driven with effective parameters. Effective frequencies can be defined quantitatively for ion bombardment energy distribution functions and rf discharge parameters by analyzing ion dynamics in ion-collisionless dual rf sheaths and a homogeneous plasma model for dual rf discharges, respectively. Unlike the driving frequency in SF CCP, the effective frequency in DF CCP is dependent on the ratio of two driving voltages or currents. This characteristic makes it possible to control the ion flux and ion bombardment energy independently. The abrupt transition of the effective frequency leads to several physical phenomena unique in DF CCP (c) 2005 American Vacuum Society.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherA V S AMER INST PHYSICS-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleDual radio-frequency discharges: Effective frequency concept and effective frequency transition-
dc.typeArticle-
dc.contributor.college전자전기공학과en_US
dc.identifier.doi10.1116/1.1931683-
dc.author.googleKim, HCen_US
dc.author.googleLee, JKen_US
dc.relation.volume23en_US
dc.relation.issue4en_US
dc.relation.startpage651en_US
dc.relation.lastpage657en_US
dc.contributor.id10158178en_US
dc.relation.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Aen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.23, no.4, pp.651 - 657-
dc.identifier.wosid000230717200015-
dc.date.tcdate2019-01-01-
dc.citation.endPage657-
dc.citation.number4-
dc.citation.startPage651-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-
dc.citation.volume23-
dc.contributor.affiliatedAuthorLee, JK-
dc.identifier.scopusid2-s2.0-25144519152-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc27-
dc.description.scptc27*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordPlusENERGY-DISTRIBUTION-
dc.subject.keywordPlusINDEPENDENT CONTROL-
dc.subject.keywordPlusION-
dc.subject.keywordPlusSIMULATION-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-

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