DC Field | Value | Language |
---|---|---|
dc.contributor.author | Luisier, A | - |
dc.contributor.author | Utke, I | - |
dc.contributor.author | Bret, T | - |
dc.contributor.author | Cicoira, F | - |
dc.contributor.author | Hauert, R | - |
dc.contributor.author | Rhee, SW | - |
dc.contributor.author | Doppelt, P | - |
dc.contributor.author | Hoffmann, P | - |
dc.date.accessioned | 2015-06-25T02:32:01Z | - |
dc.date.available | 2015-06-25T02:32:01Z | - |
dc.date.created | 2009-03-16 | - |
dc.date.issued | 2005-01 | - |
dc.identifier.issn | 0013-4651 | - |
dc.identifier.other | 2015-OAK-0000010648 | en_US |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/11145 | - |
dc.description.statementofresponsibility | open | en_US |
dc.language | English | - |
dc.publisher | ELECTROCHEMICAL SOC INC | - |
dc.relation.isPartOf | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | - |
dc.rights | BY_NC_ND | en_US |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/2.0/kr | en_US |
dc.title | Comparative study of Cu-precursors for 3D focused electron beam induced deposition (vol 151, pg C535, 2004 and vol 151, pg C590, 2004) | - |
dc.type | Article | - |
dc.contributor.college | 화학공학과 | en_US |
dc.identifier.doi | 10.1149/1.1839579 | - |
dc.author.google | Luisier, A | en_US |
dc.author.google | Utke, I | en_US |
dc.author.google | Hoffmann, P | en_US |
dc.author.google | Doppelt, P | en_US |
dc.author.google | Rhee, SW | en_US |
dc.author.google | Hauert, R | en_US |
dc.author.google | Cicoira, F | en_US |
dc.author.google | Bret, T | en_US |
dc.relation.volume | 152 | en_US |
dc.relation.issue | 1 | en_US |
dc.contributor.id | 10052631 | en_US |
dc.relation.journal | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | en_US |
dc.relation.index | SCI급, SCOPUS 등재논문 | en_US |
dc.collections.name | Journal Papers | en_US |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.152, no.1, pp.L1 - L1 | - |
dc.identifier.wosid | 000225864900087 | - |
dc.date.tcdate | 2018-03-23 | - |
dc.citation.endPage | L1 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | L1 | - |
dc.citation.title | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | - |
dc.citation.volume | 152 | - |
dc.contributor.affiliatedAuthor | Rhee, SW | - |
dc.identifier.scopusid | 2-s2.0-12744279465 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.type.docType | Correction | - |
dc.relation.journalWebOfScienceCategory | Electrochemistry | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Electrochemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
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