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dc.contributor.authorChoi, KKko
dc.contributor.authorRhee, SWko
dc.date.available2015-06-25T02:30:42Z-
dc.date.created2009-03-16-
dc.date.issued2001-01-
dc.identifier.citationJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.148, no.7-
dc.identifier.issn0013-4651-
dc.identifier.other2015-OAK-0000010295en_US
dc.identifier.urihttp://oasis.postech.ac.kr/handle/2014.oak/11102-
dc.description.statementofresponsibilityopenen_US
dc.format.extentpdfen_US
dc.languageEnglish-
dc.publisherELECTROCHEMICAL SOC INC-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleEffect of carrier gas on chemical vapor deposition of copper with (hexafluoroacetylacetonate) Cu-(I)(3,3-dimethyl-1-bulene)-
dc.typeArticle-
dc.contributor.college화학공학과en_US
dc.author.googleChoi, KKen_US
dc.author.googleRhee, SWen_US
dc.relation.volume148en_US
dc.relation.issue7en_US
dc.contributor.id10052631en_US
dc.publisher.locationUSen_US
dc.relation.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETYen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.contributor.nonIdAuthorChoi, KK-
dc.identifier.wosid000169897300032-
dc.date.tcdate2019-01-01-
dc.citation.number7-
dc.citation.titleJOURNAL OF THE ELECTROCHEMICAL SOCIETY-
dc.citation.volume148-
dc.identifier.scopusid2-S2.0-73161-
dc.description.journalClass1-
dc.description.wostc12-

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