Imprinting well-controlled closed-nanopores in spin-on polymeric dielectric thin films
SCIE
SCOPUS
- Title
- Imprinting well-controlled closed-nanopores in spin-on polymeric dielectric thin films
- Authors
- Ree, MH; Yoon, JW; Heo, KY
- Date Issued
- 2006-02-21
- Publisher
- ROYAL SOC CHEMISTRY
- Abstract
- The use of low dielectric constant (low-k) interdielectrics in multilevel structure integrated circuits (ICs) can lower line-to-line noise in interconnects and alleviate power dissipation issues by reducing the capacitance between the interconnect conductor lines. Because of these merits, low-k interdielectric materials are currently in high demand in the development of advanced ICs. This article reviews recent developments in the imprinting of closed nanopores into spin-on materials to produce low-k nanoporous interdielectrics for the production of advanced ICs.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/10902
- DOI
- 10.1039/B511301F
- ISSN
- 0959-9428
- Article Type
- Article
- Citation
- JOURNAL OF MATERIALS CHEMISTRY, vol. 16, no. 7, page. 685 - 697, 2006-02-21
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